Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applications | 6.37 MB
Title: Atomic Layer Deposition Principles, Characteristics, and Nanotechnology Applications
Author: Tommi Kääriäinen, David Cameron, Marja-Leena Kääriäinen, Arthur Sherman
Category: Nonfiction, Science & Nature, Technology, Material Science, Engineering, Mechanical
Language: English | 279 Pages | ISBN: 1118062779
Description:
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD’s application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD’s application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
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